Objective: Our goal is to prove that subcuticular sutured wounds will have less discharge than after closure with staples. Secondary outcome is patient satisfaction about wound and wound pain.
ID
Source
Brief title
Condition
- Joint disorders
- Bone and joint therapeutic procedures
Synonym
Research involving
Sponsors and support
Intervention
Outcome measures
Primary outcome
Main study parameters/endpoints: Wound discharge at day 4 post operative. 14
days after the operation the staples will be removed in the staple group and
all wounds will be scored with the ASEPSIS wound score. And pain and comfort of
the wound will be evaluated.
Secondary outcome
Patient satisfaction with treatment
Background summary
Rationale:
Development of a deep infection after total hip arthroplasty can have a
disabling result for the patient. One of the predisposing factors for a deep
infection is delayed wound healing and wound discharge. For skin closure after
cemented total hip arthroplasty different methods can be used. Two common used
methods are staples and subcuticular suture. Our hypothesis is that wounds
closed with subcuticular sutures would have less discharge than stapled wounds.
Study objective
Objective: Our goal is to prove that subcuticular sutured wounds will have less
discharge than after closure with staples. Secondary outcome is patient
satisfaction about wound and wound pain.
Study design
Study design: Prospective randomised comparing study.
Intervention
Intervention: The skin will be closed subcuticular with Monocryl 3-0 (Ethicon)
with Steri-strips (3M) or stapled with the PMW-35 stapler (Ethicon).
Study burden and risks
Nature and extent of the burden and risks associated with participation,
benefit and group relatedness: Participation will not give additional risks for
the patients because both methods are widely used well proved methods.
reinier de graafweg 3-11
2625 AD Delft
Nederland
reinier de graafweg 3-11
2625 AD Delft
Nederland
Listed location countries
Age
Inclusion criteria
ostheoarthritis
Exclusion criteria
Diabetis
Design
Recruitment
metc-ldd@lumc.nl
Followed up by the following (possibly more current) registration
No registrations found.
Other (possibly less up-to-date) registrations in this register
No registrations found.
In other registers
| Register | ID |
|---|---|
| CCMO | NL18444.098.07 |